This is the CV302

CV 302Newly-redesigned basic platform for R&D.  Start with a nominal 3", diffusion-pumped high vacuum system with a 15" baseplate, forepump and gauges. Add thermal resistance evaporation, sputter sources, fixturing, other pumps, gas inlet panel, throttling, plasma gear and make:

  • A thermal evaporator with up to five sources for optics, materials, semiconductors, photonics. 
  • A single or multi-source magnetron sputterer. Three, 2" sources common. RF or DC. Manual or auto-tuning.
  • A Reactive Ion Etch or plasma etch or deposition system.
  • A glove box modular system for OLEDs and other atmosphere - sensitive devices

302-Jar up

It's a Boss 302!